Mass spectrometric investigation of metal hydrides relevant to Extreme Ultraviolet Lithography / vorgelegt von Joshua A.D. Rieger. Wuppertal, November 2023
Inhalt
- Acronyms
- List of Figures
- List of Tables
- Scope of this work
- Introduction
- Photolithography
- EUV lithography
- Plasma
- Debris
- Mass spectrometry
- Components and structure of mass spectrometers
- Quartz crystal microbalance
- Methods & Instrumentation
- Chemicals
- Plasma sources
- Mass spectrometers
- Quartz crystal microbalance
- Fourier-transform infrared spectrometer
- Laser systems
- Syntheses
- Software
- Results & Discussion
- Synthesized stannane
- Plasma-generated stannane
- Neutral tin hydrides
- Doubly charged stannane and the stannane dimer
- Oxygenated stannane
- Comparison of the different experimental set-ups
- Ionic tin hydrides
- Doubly charged stannane and the stannane dimer
- Oxygenated stannane
- Experimental settings affecting mass spectra
- Comparison of the different experimental set-ups
- Tin deuterides
- Transport behavior of neutral and ionic tin hydride molecules in glass tubes
- Decomposition process of stannane on glass
- Other plasma-generated metal hydrides
- DFT calculations
- Initial etching phenomenon
- Quartz crystal microbalance measurements
- Simultaneous measurement of QCM and LTOF
- Conclusion & Outlook
- References