Spatial atomic layer deposition of electrically (non-)conductive gas diffusion barriers / von M.Sc. Lukas Hoffmann. Wuppertal, 23.04.2018
Inhalt
- List of Figures
- List of Tables
- Introduction
- Physical fundamentals
- Spatial atomic layer deposition
- Gas diffusion barriers
- Permeation
- Temperature-dependent permeation
- Time-dependent permeation
- Definition: Water vapor transmission rate
- Permeation through defects
- Solar cells
- Atomic layer deposition systems and barrier characterization methods
- State of the Art: Atmospheric pressure spatial ALD systems
- Atmospheric pressure plasma batch ALD system
- Atmospheric pressure spatial ALD system
- Dielectric barrier discharge plasma sources
- Optical Ca test
- Rutherford Backscattering Spectrometry / Nuclear reaction analysis
- Al2O3-based gas diffusion barriers by atmospheric pressure ALD
- SnOx-based gas diffusion barriers by spatial atmospheric pressure ALD
- SnOx growth
- SnOx film properties
- Application of electrically conductive barriers in perovskite solar cells
- On the deposition speed of spatial ALD
- Experimental Data
- Influence of the substrate velocity on the ALD growth of Al2O3
- Influence of the substrate velocity on the ALD growth of SnOx
- Dependence of deposition speed on barrier properties
- Simulation of ALD growth
- Conclusion
- Appendix