Spatial atomic layer deposition of electrically (non-)conductive gas diffusion barriers / von M.Sc. Lukas Hoffmann. Wuppertal, 23.04.2018
Content
List of Figures
List of Tables
Introduction
Physical fundamentals
Spatial atomic layer deposition
Gas diffusion barriers
Permeation
Temperature-dependent permeation
Time-dependent permeation
Definition: Water vapor transmission rate
Permeation through defects
Solar cells
Atomic layer deposition systems and barrier characterization methods
State of the Art: Atmospheric pressure spatial ALD systems
Atmospheric pressure plasma batch ALD system
Atmospheric pressure spatial ALD system
Dielectric barrier discharge plasma sources
Optical Ca test
Rutherford Backscattering Spectrometry / Nuclear reaction analysis
Al2O3-based gas diffusion barriers by atmospheric pressure ALD
SnOx-based gas diffusion barriers by spatial atmospheric pressure ALD
SnOx growth
SnOx film properties
Application of electrically conductive barriers in perovskite solar cells
On the deposition speed of spatial ALD
Experimental Data
Influence of the substrate velocity on the ALD growth of Al2O3
Influence of the substrate velocity on the ALD growth of SnOx
Dependence of deposition speed on barrier properties
Simulation of ALD growth
Conclusion
Appendix